Chemical Vapour Deposition (CVD) is a vacuum deposition method used to produce high quality, high-performance, solid materials. A CVD method is exposed to one or more vaporised compounds, one or more of which contain desirable constituents. A chemical reaction is initiated, at or near the substrate surface, to produce the desired material that will condense on the substrate. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.
Related Definitions in the Project: The Process Engineering
